Atomic Layer Deposition (ePub)
Principles, Characteristics, and Nanotechnology Applications
(Sprache: Englisch)
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD...
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Autoren-Porträt von Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman
Tommi Kääriäinen is a researcher at theAdvanced Surface Technology Research Laboratory (ASTRaL) in
Lappeenranta University of Technology (LUT), Finland. He has over
nine years of experience in thin film deposition and analytical
techniques. He has especially focused on atomic layer deposition
(ALD) at low temperatures and recently on spatial and roll-to-roll
ALD.
David Cameron received his BSc in electrical and
electronic engineering from the University of Glasgow in 1972. In
2004, he joined LUT as Professor of Material Technology and
Director of ASTRaL. His research career has been in the area of
thin film deposition and since joining ASTRaL, his work has focused
on ALD. He has also worked on molecular beam epitaxy, plasma
chemical vapour deposition, magnetron sputtering, and sol-gel
deposition.
Marja-Leena Kääriäinen has conducted ALD
research for over 10 years. Her focus has been on the growth and
structure of nanoscale metal oxide films. She has a particular
interest in the photoactivity, photocatalytic activity, and
antibacterial properties of ALD-grown thin films. Her background is
in chemical engineering, which she studied at LUT and Michigan
Technological University. Currently, she is a researcher at
ASTRaL.
Arthur Sherman has 60 years of industrial experience,
which includes almost 20 years with General Electric, seven years
on the corporate staff of RCA, several years at Applied Materials,
and six years at Varian Associates. He earned a master's degree in
aeronautical engineering at Princeton University and a PhD at the
University of Pennsylvania. He has published extensively, including
approximately 50 research papers published in archive journals and
three scientific monographs.
Bibliographische Angaben
- Autoren: Tommi Kääriäinen , David Cameron , Marja-Leena Kääriäinen , Arthur Sherman
- 2013, 2. Auflage, 272 Seiten, Englisch
- Verlag: John Wiley & Sons
- ISBN-10: 1118747380
- ISBN-13: 9781118747384
- Erscheinungsdatum: 17.05.2013
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eBook Informationen
- Dateiformat: ePub
- Größe: 6.36 MB
- Mit Kopierschutz
Sprache:
Englisch
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