Physical and Chemical Aspects of Organic Electronics (PDF)

Part I Industrial Applications 1 Organic Transistors as a Basis for Printed Electronics 2 Printable Electronics: Flexibility for the Future Part II Molecular Compounds 3 Fluorinated Phthalocyanines as Molecular Semiconductor Thin Films 4 Novel Organic Semiconductors and Processing Techniques for Organic Field-Effect Transistors 5 Assembly, Structure, and Performance of an Ultra-Thin Film Organic Field-Effect Transistor (OFET) Based on Substituted Oligothiophenes 6 Organic Transistors Utilising Highly Soluble Swivel-Cruciform Oligothiophenes Part III Structural and Morphological Aspects 7 Chemical Approaches to the Deposition of Metal Electrodes onto Self-Assembled Monolayers 8 Growth Morphologies and Charge Carrier Mobilities of Pentacene Organic Field Effect Transistors with RF Sputtered Aluminium Oxide Gate Insulators on ITO Glass 9 In Situ X-Ray Scattering Studies of OFET Interfaces 10 X-Ray Structural and Crystallinity Studies of Low and High Molecular Weight Poly(3-hexylthiophene) 11 Molecular Beam Deposition and Characterisation of Thin Organic Films on Metals for Applications in Organic Electronics 12 Fundamental Interface Properties in OFETs: Bonding, Structure and Function of Molecular Adsorbate Layers on Solid Surfaces 13 Metal/Organic Interface Formation Studied In Situ by Resonant Raman Spectroscopy 14 Development of Single-Crystal OFETs Prepared on Well-Ordered Sapphire Substrates Part IV Device Performance and Characterisation 15 Pentacene Devices: Molecular Structure, Charge Transport and Photo Response 16 Characteristics and Mechanisms of Hysteresis in Polymer Field-Effect Transistors 17 Ambipolar Charge Carrier Transport in Organic Semiconductor Blends 18 Gate Dielectrics and Surface Passivation Layers for Organic Field Effect Transistors 19 Influence of Metal Diffusion on the Electronic Properties of Pentacene and Diindenoperylene Thin Films 20 Potentiometry on Pentacene OFETs: Charge Carrier Mobilities and Injection Barriers in Bottom and Top

Christof Wöll studied physics at the Georg-August University in Göttingen, Germany, and received his Ph.D. degree from the Max-Planck-Institute for Flow Research in 1987. From 1988 to 1989, he worked as a postdoctoral fellow at the IBM Division in San Jose, USA, researching in scanning tunnelling microscopy of clean and adsorbate covered metal surfaces. In 1992 followed his Habilitation in Physics from the University of Heidelberg, where he lectured in physical chemistry. From 1994 to 1996, Professor Wöll was a Heisenberg Fellow of the Deutsche Forschungsgemeinschaft at the Institute of Physical Chemistry, University of Heidelberg. He has published over 180 articles and is a member of the editorial boards of several journals.

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